RAITH150-TWO
bd
…offers modern EBL system architecture AND its mini-environment renders infrastructure investments unnessecary .
…is the right choice for
Researchers and universities

* Easy to learn and to use for all skill levels
* Multi-user management supports concurrent access by multiple users with different privileges

Industrial and academic development groups

* Professional-grade GDSII design files
* Automated task lists
* Device, wafer or mask level operation

Centralized nano and service centers

* Multi-project wafer exposures
* Fastest operation speed
* Well-established support with professional support teams

…enables extensive applications

* Ultra High Resolution (UHR) exposures
* Mix-and-match with optical lithography
* Advanced device prototyping
* High resolution template writing
* Optical devices with zero stitching error